Designing and manufacturing of interference notch filter with a single reflection band

The main idea of this work is to design a notch filter structure with narrow width and maximum reflection while reducing fabrication challenges. In addition, using anti-reflection layers in the outermost part designed structure, pass-band ripples are reduced. study, we considered [(nHnL)s (mHmL)p (nHnL)z] n=5 m=3. Using form combining 3 5 quarter-wave coefficients instead 1 3, could reach narrower NW fewer periods HL layers. stability deposition conditions density affect their quality consequently result environmental tests. Hence, construct employed sputtering method RF DC sources. our experiments, showed that use simple shield prevents oxidation targets’ surfaces as well reduces rate increases processes. Fabricated Samples have been subjected variety tests, including humidity, hard soft abrasion, temperature, adhesion tests satisfactory results.